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Graphic etching focused ion beam (FIB)

Focused ion beam system ZEISS Crossbeam 540

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The Crossbeam 540 focused ion beam (FIB) system uses a liquid gallium ion source. The lifetime of the ion source is 3000 Ah. The resolution of the accelerated voltage 30kV is up to 3nm. Five gas injection systems and a sample manipulator for transmission electron microscopy are also provided. The system can be applied to cross section and tomography, 3D analysis, TEM sample preparation and nano graphic processing.