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Photolithography device - electron beam lithography

Electron beam photolithography system JEOL JBX-9500FS

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JEOL JBX-9500FS is a 100kV circular beam electron beam lithography system. The maximum size can hold a wafer of 300mm and a 6 inch mask. It has the scanning speed of 100MHz. The writing accuracy of the writing field of 1000 m * 1000 m is up to + 11nm, the field stitching accuracy is + 10nm, and the location accuracy of the writing field is + 9nm. By using 20 bit beam positioning DAC and 14 bit scan DAC, the scanning step of 0.25nM can be obtained. The system is suitable for R & D and production in many fields such as photonic devices, communication devices and nanoimprint lithography.