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Electron beam lithography

By using the method of electron beam direct writing, the predesigned graph is obtained on the photoresist.

The electronic beam lithography model is JEOL JBX-9500FS, with a maximum support of 6 inches. Support positive/negative photoresist, support set. The precision of the set is 20nm, the precision of the field is 20nm, and the positioning accuracy is 15nm.


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The service is introduced:

By using the method of electron beam direct writing, the predesigned graph is obtained on the photoresist.

The electronic beam lithography model is JEOL JBX-9500FS, with a maximum support of 6 inches. Support positive/negative photoresist, support set. The precision of the set is 20nm, the precision of the field is 20nm, and the positioning accuracy is 15nm.


The service content:

1. Wash the substrate (depending on the case)

2. Rotary coating photoresist.

3. The baking

4. Electron beam exposure.

5. Development/fixing.

6. Bake

7. Optical detection


Service description:

Customer needs to provide: substrate and layout electronic (. GDS format). A set of engraving instructions shall be provided.

Experimental period: depending on the degree of difficulty.

Fee standard: $x per hour; Special pieces will be negotiated separately.


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