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Electron beam evaporation deposition film

By means of electron beam evaporation, the film is deposited in the substrate. Can deposit metal and dielectric film.

The device model is Kurt LAB Line PVD 75, with the maximum support of 6 inches.


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The service is introduced:

By means of electron beam evaporation, the film is deposited in the substrate. Can deposit metal and dielectric film.

The device model is Kurt LAB Line PVD 75, with the maximum support of 6 inches.


The service content:

1. Substrate cleaning (depending on the case)

2. Electron beam evaporation deposition film.

3. Optical detection


Service description:

Customer needs to provide: substrate. Special materials will be provided by the customer to provide the evaporating source material.

Experimental period: 1-2 working days.

Fee standard: xx yuan/piece; Special pieces will be negotiated separately.


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