Home - Technology - Single step process

Ultraviolet Lithography

Using the uv exposure method, the image on the mask is transferred to the photoresist.

Exposure mode is contact exposure. The lithography model is SUSS MA/BA6, which can be used for front/back cover, with maximum support of 6 inches. Support positive/negative photoresist.


Contact us

The service is introduced:

Using the uv exposure method, the image on the mask is transferred to the photoresist.

Exposure mode is contact exposure. The lithography model is SUSS MA/BA6, which can be used for front/back cover, with maximum support of 6 inches. Support positive/negative photoresist.


The service content:

1. Wash the substrate (depending on the case)

2. HMDS pretreatment (depending on the case)

3. Rotate the photoresist.

4. Bake

5. Alignment exposure

6. Development/fixing.

7. Bake

8. Optical detection


Service description:

Customer needs to provide: substrate and lithography. A set of engraving instructions shall be provided.

Experimental period: 1-2 working days. It depends on how easy it is.

Charging standard: single step exposure times/sheet; (1) the front set shall be engraved with x yuan/piece; On the back of the set of x yuan/piece; Special pieces will be negotiated separately.


Results show: